Available for Licensing: High-Quality Actinide Thin Films via Molecular Beam Epitaxy for Quantum and Optoelectronic Devices
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Available-for-licensing technology for high-quality actinide thin films via molecular beam epitaxy enabling quantum and optoelectronic device development with precise material control.
This summary is AI-generated from the official solicitation.
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High-Quality Actinide Thin Films via Molecular Beam Epitaxy for Quantum and Optoelectronic Devices Description Researchers at INL have developed a process to deposit high-quality epitaxial crystalline thin films of uranium and thorium, as well as their nitrides, using molecular beam epitaxy (MBE). MBE is a non-equilibrium vacuum deposition technique that provides precise control over the composition and interfaces of the material, making it ideal for fabricating high-purity, defect-free, single-...
Read full description on official sourceMore ENERGY, DEPARTMENT OF Opportunities
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